Oxide Thin film Laboratory @HUFS  

Our research group is devoted to studying the growth and properties of oxide thin films. Oxides, the most abundant materials, would exhibit novel electronic properties like metal-insulator transitions, magnetoresistance, and high Tc superconductivity, etc. The rapid progress in this area during the last twenty years enables us to design and synthesize theses materials by using pulsed laser deposition (PLD) techniques for high-crystalline epitaxial film growths. More recently our work is focused on studying the resistive switching of oxide thin films for application in non-volatile memory.